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Ardamax Keylogger 5.2 Crack Key + Torrent Free Download.1. Field of the Invention
The present invention relates to a mask inspection apparatus and a mask inspection method for inspecting a mask used to expose a substrate through lithography.
2. Related Art
In an exposure apparatus, a pattern formed on a mask (reticle) is projected on a substrate through a projection optical system.
When an image of the pattern projected on the substrate is deviated from a designed image, displacement of the substrate relative to the mask cannot be detected. Therefore, it is necessary to detect displacement of the substrate relative to the mask.
As one of methods for detecting displacement of a substrate relative to a mask, there is a method of detecting displacement of an alignment mark on a substrate through an image sensor. Japanese Patent Application Laid-Open No. 2004-075435 discloses a method of detecting a displacement amount of a substrate relative to a mask, in which an alignment mark on a substrate is imaged, and the displacement amount of the substrate relative to the mask is calculated from image data of the alignment mark.
Japanese Patent Application Laid-Open No. 2004-075435 discloses a method of calculating the displacement amount of a substrate relative to a mask by comparing image data of an alignment mark formed on a substrate (hereinafter, referred to as “substrate image data”) with image data of the alignment mark previously stored in a storage region, and calculating a difference between images of the alignment mark in the substrate image data and in the stored image data.
In general, in exposure apparatuses using a resist process, as alignment marks on a mask, a plurality of alignment marks formed in a peripheral region (peripheral light blocking region) of a mask are used. These alignment marks are formed in a structure like a grid pattern in the same shape and density as a pattern to be formed, and a fine pattern like a dot pattern is formed in a line on this alignment mark.
In the method described in Japanese Patent Application Laid-Open No. 2004-075435, the difference between images of the alignment mark in the substrate image data and in the stored image data is calculated. That is, a difference between images of the alignment marks in image data of the peripheral light blocking region is calculated. Therefore, it is difficult to calculate the difference between images of the alignment mark accurately.
In addition, in the method of calculating the displacement amount of the substrate relative to

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